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Photoluminescence characterization of polycrystalline n-type Cu2O films

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dc.contributor.author Garuthara, R. en_US
dc.contributor.author Siripala, W. en_US
dc.date.accessioned 2014-11-19T04:44:38Z
dc.date.available 2014-11-19T04:44:38Z
dc.date.issued 2006
dc.identifier.issn 0022-2313 en_US
dc.identifier.uri http://repository.kln.ac.lk/handle/123456789/3987
dc.description.abstract Electrodeposition was used to deposit Cu2O thin films on ITO substrates. Photoresponse of the film clearly indicated n-type behavior of Cu2O in photoelectrochemical cells. The temperature dependence of photoluminescence (PL) revealed that the spectra consist of donor?acceptor pair emissions and the recombination between electrons bound to donors and free holes. We observed that the dominant intrinsic defect, oxygen vacancies, creates a donor energy level at 0.38 eV below the bottom of the conduction band. As a result, this donor level acts as a center for both PL emissions and to produce n-type conductivity in the electrodeposited Cu2O films. In addition, an acceptor energy level at 0.16 eV from the top of the valence band was observed. en_US
dc.publisher Journal of Luminescence en_US
dc.subject n-Type polycrystalline Cu2O; Photoluminescence en_US
dc.title Photoluminescence characterization of polycrystalline n-type Cu2O films
dc.type Article en_US
dc.identifier.department Physics en_US


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